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Fundamentals of Modern VLSI Devices

📅 December 2, 2021 👤 Yuan Taur, T.H. Ning 📖 Cambridge University Press eBooks 📊 744 citations

🤖 Plain-English Summary

A thoroughly updated third edition of an classic and widely adopted text, perfect for practical transistor design and in the classroom. Chapters have been reorganized to integrate the appendices into the main text to enable a smoother learning experience, and numerous additional end-of-chapter homework exercises (+30%) are included to engage students with real-world problems and test their understanding.

🔑 Key Findings

  • Covering a variety of recent developments, the internationally renowned authors discuss in detail the basic properties and designs of modern VLSI devices, as well as factors affecting performance.
  • Containing around 25% new material, coverage has been expanded to include high-k gate dielectrics, metal gate technology, strained silicon mobility, non-GCA (Gradual Channel Approximation) modelling of MOSFETs, short-channel FinFETS, and symmetric lateral bipolar transistors on SOI.
  • Chapters have been reorganized to integrate the appendices into the main text to enable a smoother learning experience, and numerous additional end-of-chapter homework exercises (+30%) are included to engage students with real-world problems and test their understanding.

💡 Why This Matters

This research advances how AI systems learn, reason, and solve problems — with direct implications for automation and scientific discovery.

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📋 Article Details

Category 🤖 Artificial Intelligence
Published Dec 02, 2021
Journal Cambridge University Press eBooks
Authors Yuan Taur, T.H. Ning
DOI 10.1017/9781108847087
Citations 744
Source OpenAlex

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